Yastrubchak O. Plasmon resonance in multilayer diffraction gratings on the GaAs or InP semiconductor surface

The aim of this work is a comprehensive analysis of excitation and propagation of surface plasmon polaritons in multilayered solid state systems deposited on the diffraction gratings on GaAs and InP depending on optical, morphological and structural properties of such system's components. The technology for preparation of several types of rough surfaces (spontaneous random (dendrits) and quasiperiodic (quasigratings), deterministic (diffraction gratings)) on the surface GaAs and InP was elaborated. We successfully used the concept of fractals as a bridge between deterministic (periodic) and random (spontaneous) surfaces and several types of rough surfaces have been defined. It is shown that the increasing of damping and decreasing surface plasmon polariton propagation length is caused by grating surface roughness, which is directly connected with surface fractal dimension. The optical, geometrical and structural parameters of multilayered diffraction gratings for maximal transformation of incident ultr aviolet, visible or near infrared p-polarized light into surface plasmon polariton wave was proposed. The photodetector as an optochemical sensor based on multilayer system on the diffraction grating was presented. We also proposed the photodetector based on the measurements of p-to-s polarized light reflection conversion to enhance the photodetector efficiency and selectivity.