Marchenko I. Processes of low-temperature structure formation in the near-surface layers of solids under action of atomic-ion fluxes

The object is the structure of near-surface layers of solids, which form under low-temperature influence of atom-atom fluxes. Aim: the determination of peculiarities of physical processes of low-temperature near-surface layers of solids structure formation under the influence of atomic-ion fluxes. Methods: method of pair collisions, method of molecular dynamics, the kinetic method of Monte-Carlo, the methods of numerical solutions of differential equations. It is established that the nanostructure of thin layers of metals under the low-temperature precipitation is determined by the processes of generation and development of morphological instability on the surface of the film during its growth. The influence of low-energy irradiation by self ions on the surface morphology and on the volume microstructure of niobium and copper films is investigated. It is established that the change of the value and character of microstresses in the films, which grow under irradiation is determined by the formation of clusters of internodal atoms, which appear as a result of the development of atom-atom collision cascades. The peculiarities of near-surface layers of solids under the implantation of metallic and gas ions and also under the ion-stimulated precipitation are determined. It is established that the field of ion current values and of ion processing energies, for which the process of ion nitration can be performed the most effectively. Field of application: physics of solid state, nanophysics