Shtapenko E. The Kinetics of the structure formation and properties of electrodeposited metal films.

Українська версія

Thesis for the degree of Doctor of Science (DSc)

State registration number

0517U000473

Applicant for

Specialization

  • 01.04.07 - Фізика твердого тіла

02-06-2017

Specialized Academic Board

Д 08.051.02

Oles Honchar Dnipro National University

Essay

The object of research is the physical patterns of the formation of the structure of electrically deposited metal films on metal substrates obtained by precipitation on constant, impulse currents and under conditions of laser influence. The purpose of the dissertation is to establish the relationship between the kinetics of electrocrystallization, the structure and properties of metallic films. Phase composition and substructure of metallic films were investigated by X-ray and electron diffraction methods. Spectral microanalysis of the elemental composition of the surface and the boundary of the "film-lining" was carried out using raster electron microscopy. The microstructure of metal films was investigated by a metallographic method using optical microscopes. Physical properties of coatings and films were investigated by methods of measuring microhardness and adhesion strength. Experimental determination of Young's modulus was carried out by acoustic and strain-gauge methods. To calculate kinetic and thermodynamic quantities, quantum-mechanical calculations were used. The binding energy of the ad-atom with the substrate was calculated using the density function theory (TFD). The use of complementary research methods, the tried and tested apparatus of mathematical and statistical physics with the package of modern computer programs allowed to obtain a correlation between the results of model and experimental studies, as well as their compliance with modern physical representations, which ensures the reliability of the scientific results. The work develops existing ideas about the physical mechanisms of the formation and growth of a metallic film in adsorbed layers in electrocrystallization of metals. In the work for the first time, on the basis of calculations of the binding energy of the atoms of Ni, Cu, Fe and Zn on wettable and non-absorptive substrates, mechanisms of nucleation in adsorbed layers at high overvoltages have been established. It has been shown for the first time that in the process of film growth, the value of the crystallographic indexes of the axial texture decreases. Based on the study of kinetics of electrocrystallization, models and mechanisms of growth of metallic electrodeposited films for various surge superstructures are grounded. Complex studies of the transition layer at the boundary of the "film-lining" showed that in the initial stages there is the formation of a diffusion region on the edge of the "film-lining", which is the determining factor responsible for the adhesion strength of metal films with a metal lining. The value of the activation energy of bulk diffusion in the framework of the model of inconsistent spheres has been calculated, which allowed to predict the possibility of forming a solid solution on the boundary of the "film-lining". The practical value of the results obtained is to establish the patterns of formation of the structure, which makes it possible to obtain metallic films with the necessary given properties. These results are of interest to microelectronics in terms of functional coatings and hardening coatings for machine building.

Files

Similar theses