Ryabtsev S. Metastabile states in quenching from a melt and a vapor alloys and unmixed systems.

The object of the study is the formation of metastable phases in films that are obtained by ion-plasma sputtering of alloys and quenching from the liquid state. The forming of the metastable phases in films which are got by quenching from the melt and the deposition from the vapor of atoms with increased energy was the object of research of work. The phase composition and structure of materials obtained by ion-plasma sputtering of alloys and quenching from the liquid state were studied by X-ray diffraction analysis, electron microscopy. The distribution of saturating elements in the sputtered films was determined by means of an energy-dispersive analysis. The kinetics of the processes of structural transformations was studied by X-ray diffraction, and the construction of a change in the electrical resistivity upon heating in a vacuum. To measure electrical and magnetic properties, methods of resistometry and vibrational magnetometry were used. The use of complementary research methods, the approved apparatus of mathematical and statistical physics with a package of modern computer programs, made it possible to obtain a correlation between the results of model and experimental studies, as well as their correspondence with the modern physical representation, which ensures the reliability of the scientific results obtained. The work develops existing ideas about the physical mechanisms of the formation of metastable states in films in the ion-plasma deposition of atoms with increased energy and quenching from the liquid state. The practical value of the results obtained lies in the possibility of forming new metastable phases during quenching of melts and modernized ion-plasma sputtering, in the possibility of obtaining metallic films with improved physical properties (high coercivity, low temperature coefficient of resistance, high emission current density at relatively low temperature of the film cathode surface on the basis of the immiscible alloy (W, Ni) with Ba), promising for the production of film cathodes, magnets and high-resistance precision resistors.