Verbitska T. Phase formation regularities and thermal stability of the nickel silicide phase NiSi in thin film systems Co-Ni, Ni-Ti, Ni-Si on silicon monocrystals

Українська версія

Thesis for the degree of Candidate of Sciences (CSc)

State registration number

0405U000448

Thesis Registration Form

0405U000448.pdf

Applicant for

Specialization

  • 05.16.01 - Металознавство та термічна обробка металів

31-01-2005

Specialized Academic Board

К 26.002.12

Essay

The dissertation is devoted to determination of regularities of phase composition formation and structure as result of the thermal activated solid state reactions and range of thermal stability of nickel silicide phase NiSi in thin film systems Co, Ni, Co-Ni, Ni-Tі and in the multilayer thin films nanodimension systems Ni/Si/Ni/Si…, Co/Si/Co/Si…, Ni/Tі/Ni/Ti… deposited on to monocrystalline silicon. Key words:multilayer films, amorfous state, phase, annealing, silicide, substrate, structure.

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