Therpy D. The structure and physical properties of borides thin films deposition by rf - magnetron sputtering

The researches of sputtering conditions and condensation condition influence on a phase composition, structural perfection and properties of films are in the thesis. A film gained by means of through an ion - plasma sputtering of targets ZrB2 and VB2 by rf-magnetron system. Basic factor, which influences on films composition and films structure, during an ion - plasma high-temperature compounds condensation, is the mode of sputtering target atoms to a condensing surface transport. Therefore, mechanism, which allows to realize simulation transport conditions of substance through a discharge gap, is offered. The changes of the stream characteristics of condensable atoms can be described through such simulation. Besides the outcomes of simulation and calculation of supersaturation (according to the scheme offered in the present operation) allow to realize selection of sputtering and condensation parameters, which are most favorable for obtaining films possessing given properties. Three main regimes of ion- plasma sputtering systems are selected. The target sputtering speed influence on processes of creation of films is investigated experimentally and theoretically. The practical guidelines for obtaining epitaxial and nanocrystallin films of the researched compounds are reduced.