Zamulko S. FORMATION OF SILICIDE PHASES AT THE REACTIONARY DIFFUSION IN "FILMS LAYERS (5 - 30 nm) TI, NI - MONOCRYSTAL SILICON" SYSTEMS

Українська версія

Thesis for the degree of Candidate of Sciences (CSc)

State registration number

0406U001434

Applicant for

Specialization

  • 05.16.01 - Металознавство та термічна обробка металів

20-03-2003

Specialized Academic Board

K26.002.12

Essay

The thesis have been devoted to an experimental research and theoretical simulation of thermo stimulated reactionary diffusion processes in systems "films layers Ni (Ti, Ni-Ti) nanometer thicknesses (5 - 30 nanometers) - monocrystal Si (001)"

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