Pugina K. Molecular dynamics simulations of ion induced sputtering of surface metal clusters

The mechanisms of ion induced sputtering of surface metal clusters have been investigated. As investigation technique molecular dynamics simulations was used. The number of molecular dynamics experiments have been fulfilled during which copper and gold clusters were sputtered by low energy Ar ions (200 eV) from surfaces of copper and gold substrates. We obtained, that during ion induced sputtering of surface metal clusters the preferred directions in the motion of atoms, which are sputtered from clusters, take place. Substrate exert key influence on the forming of these directions, since the cluster-substrate interaction determine the surface cluster structure. Also it was obtained, that substrate serves as energy drain for cascade cluster atoms. Surface cluster sputtering process dependence from cluster geometry have been determined. Temperature influence on the surface cluster sputtering process have been investigated. It was shown, that thermal vibrations of atoms leads for defocusing of sputtered cluster atoms. It was demonstrate, that the most intensively development of atomic collisions cascade take place in the homogeneous systems the cluster/substrate.