Bihun R. Size effect in electron properties of thin metal films deposited on dielectric and low conducting substrates.

The results of researches published in 15 scientific works are presented to defense a thesis. The thesis is devoted to investigate structure and electrical properties of thin metallic films. The aim of present study is to investigate the influence of charge carriers surface and grain-boundary scattering on electron transport in films deposited on substrates predeposited with surfactant under layer.The investigations were performed in all-glass soldered ultra-high vacuum chambers. The residual gas pressure in the chamber was less than 10-7 Pa. The metal films were deposited onto clean glass or on glass predeposited with surfactant under layer held on 78K or 300K at a rate of 0.1 to 0.2 nm/min by thermal evaporation. Thin films thickness was monitored by applying a quartz-crystal oscillator. The sample thickness increased by additional deposition on the same film.