Konovalov V. Structure, composition, features of growth and properties of tantalum and hafnium diboride films

Object: coverings from borides of the refractory transitive metals, received by means of a method of ionic-plasma dispersion. The purpose: an determination of the influence of mass transfer processes, of the physical conditions of precipitation and substance consolidation on the surface of precipitation which take place at ionic-plasma dispersion of a target, on structure, structure morphology and physical-mechanical properties of coverings. Methods: nonreactive high-frequency magnetron dispersion, x-ray diffractometry, raster and transmission electronic microscopy, secondary ionic mass spectrometry, x-ray microanalysis, nanoindenting, probe methods. Results: complex regular studying of structure, structure and physical-mechanical properties of nanostructure coverings of diboride of tantalum and of diboride of hafnium is spent. Influence of thermal heating of a substrate and low-energy ionic and electronic bombardment of a surface of precipitation on processes of condensation of films is determined, the explanation of the physical nature of the specified influence is offered. The dependence of physical-mechanical characteristics of nanocrystalline coverings from their structural condition, structure and the size of grain is defined and its physical explanation is resulted. The field of application: physics of a solid state, physics of thin films, radiating physics