Styervoyedov A. Formation of nanoscale Ti-O-N and Cr-O-N films with ion-beam methods

Object: Ti-O-N and Cr-O-N films of nanoscale thickness with different stoichiometry, received by methods of ion-beam sputter deposition and ion-beam assisted deposition. The purpose: the determination of laws of Ti-O-N and Cr-O-N films of nanoscale thickness synthesis with ion-beam sputter deposition and ion-beam assisted deposition methods in the controlled vacuum environment for the optimization of processes of reception of functional nanoscale films and nanostructures with the beforehand set properties. Methods: X-ray photoelectron spectroscopy, scanning tunneling and atomic force microscopy, a method of secondary ion mass spectrometry, a method of mathematical modeling of ions free path in a solid state - software package SRIM, original methods of measurement of parameters of ions beams and atomic-molecular streams in the vacuum environment. Results: The technology of Ti-O-N films synthesis with nanoscale thickness by means of titanium deposition in controlled vacuum environment by Ar+ ions beam sputtering with energy = 5 keV and low density of ion current on a target (10 - 15mkA/sm2) is proposed. The influence of vacuum conditions during the films synthesis on the element structure and the chemical state of the generated structures is shown. For the first time the dependences of a chemical condition of nanoscale structures Ti-N-O/Si from the substrate temperature during the formation by a method of ion-beam deposition and the temperature annealing are experimentally determined. The influence of the temperature of the TiNxOy films growth on the formation of internuclear bonds of nitrogen and the titanium is defined. Field of application: physics of solid state, the physics of thin films, nanophysics