Srebniuk P. Structure, physical and mechanical properties of combined ion-plasma silicon containing functional coatings

The dissertation is devoted to the definition of influence of the physical and technological parameters of deposition, in particular, the partial pressure of the working gas and the bias potential, on the formation of multilayer nitride coatings, which consists of the layers of silicon-doped nitride coatings and layers of hard nitride systems, such as (TiSi)N/MoN, (TiAlSi)N/CrN, (TiAlSi)N/ZrN, (TiAlSi)N/MoN, (TiAlSiY)N, (TiAlSiY)N/(TiCr)N. The deposition was performed from two sources. It was shown that the increase of partial nitrogen pressure PN during the deposition leads to decrease of silicon content and to increase of molybdenum content in coatings. The phase composition of coatings was changing with the increasing of PN during the process from TiN/Mo at the lowest pressure to TiN/MoN at the highest pressure. The existence of the structural state addicted to streaming in Ti-Si layers leads to formation of the phase state Ti5Si3 in the coatings with a small amount of the nitrogen ( < 20%) during the high-temperature annealing. Wherein hardness is increasing to 45,2 GPa. Formation of the silicon-doped (TiAlSi)N layers during the deposition is serve to attainment of the super-hard state (49,5 GPa) in the single-layered coating, which was obtained with Ubias = – 200 V.