Shepida M. Deposition of nanostructured metals (Ag, Au, Pd) on silicon electrolysis and galvanic replacement from DMSO and DMF solutions

The object of the study is the deposition of metal nanoparticles (Ag, Au, Pd) on the silicon surface by a pulsed electrolysis regime and the method of galvanic substitution in the medium of organic aprotic solvents. The aim of the work is to develop a controlled electrochemical deposition of metal nanoparticles on the silicon surface in an environment of organic aprotic solvents to obtain functional nanostructures. Research methods: voltammetry and chronoamperometry, energy-dispersive x-ray microanalysis, scanning electron microscopy, atomic force microscopy. Scientific novelty: a complex solution of the problem of the controlled electrochemical deposition of nanostructured metals (Ag, Au, Pd) on a silicon surface in the medium of organic aprotic solvents, which allowed to obtain silicon / nanomaterial nanomaterials with functional properties; regularities of the influence of the main parameters of the pulsed electrolysis regime on the geometry of the nanoparticles and the morphology of the nanostructured sediment on the silicon surface were established; the dependence of the morphology of the obtained nanostructured metals (Ag, Au, Pd) and the size of the nanoparticles on the concentration of the ions of the renewable metals, the duration and temperature of the process of galvanic substitution were determined. Degree of implementation: high efficiency of functional silicon / nanometal systems is confirmed by the results of testing at the Research Center of the Committee of Forensic Expertise of the Republic of Belarus. Scope: nanotechnology, technology of electrochemical industries; in research institutes and the educational process.