Shaginyan L. Formation Mechanisms of Thin Films Obtained by Different Types of Ion-Plasmous Deposition

Dissertation is devoted to the investigation of general mechanisms and revealing of basic physical factors, influencing on the formation of composition and structure of the films, obtained by: reactive ion plating, various modifications of magnetron sputtering, PA CVD and pulsed laser deposition. It is established that the form of film-forming particles (atoms, molecules, atomic clusters) and the energy of of species impinging the growth surface are the universal factors determining film composition and structure for all deposition methods. It is shown that complete controllability of the film properties can be achieved in case of atomic nature of film-forming species together with the possibility to control the energy of particles impinging the condensation surface. The results obtained serve as a base for scientific selection of appropriate deposition method for fabrication of the films with required properties.