Novikov S. Simulation of X-ray topographic defect images in real Si crystals

Українська версія

Thesis for the degree of Doctor of Science (DSc)

State registration number

0511U000061

Applicant for

Specialization

  • 01.04.07 - Фізика твердого тіла

27-11-2010

Specialized Academic Board

Д 76.051.01

Essay

The devoted determination of mechanisms and regularities of diffraction patterns formation for single defects in silicon (microdefects, dislocations, dislocation loops and Lomer-Cottrell locks) and their complexes on sectional and projection topographs at the action of external influences (ultrasonic deformations, equidistant and exponential bending of atomic planes and action of concentrated forces). The specific effects - channeling effect and effect of total external X-ray reflection in the case of the perpendicular edge dislocation in the Borrmann fan - were established. The features of formation of intensity oscillations in dependence on thickness in the strongly distorted areas of the crystal.

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