Kravchenko O. Structure and electrical properties of Au, Cu, Ni, Pd thick nanometer films on amorphous substrates.

The results of researches published in 13 scientific works are presented to defense a thesis. The thesis is devoted to investigation of structure and electrical properties of ultrathin Cu, Au, Ni and Pd films deposited on subatomic thickness germanium sublayers. The main aim of present thesis is show the influence of surfactant germanium sublayers on structure, electron scattering on surface and grain-boundary in investigated metal films.The investigations were performed in glass and metal ultra-high vacuum chambers. The residual gas pressure in the chamber was less than 10-7 Pa. The metal films were deposited onto clean glass or on glass predeposited with germanium sublayers held on 78 K at a rate of 0,1 to 0,2 nm/min by thermal evaporation. Thin films thickness was monitored by applying a quartz-crystal oscillator. The sample thickness increased by additional deposition on the same film.TEM, STM and electron-diffraction examinations of films gave the following results. Metal layers were polycrystalline and continuous, they had a crystal lattice similar to bulk metals. The average linear crystalline size D in the plane parallel to substrate did not depend on the film thickness. It was shown, that germanium sublayers reduce average linear crystalline sizes of investigated metal films compared to metal films deposited on clear glass substrate.