Kostruba A. Ellipsometry of ultrathin film structures

The main result is solving the problem of independent determination of the thickness and the refractive index of transparent ultra-thin film structures under conditions of low optical contrast on the film-substrate surface. Original methods for the measurements and the solution of the inverse ellipsometry problem are suggested for the system "ultra-thin transparent film - transparent substrate" in the thickness range 1.0-20.0 nm. It is shown that the method elaborated by us for calculating standard error allows one to combine the sensitivity analysis for the ellipsometry measurements with the correlation analysis whenever the three parameters of ultrathin absorbing films are determined. All proposed methods were approbated.