Demchyshyn A. Geometric modeling of material vapor flows filtering in vacuum

The paper presents results of research carried out on geometric modeling of vapor flows filtering process in vacuum. Material flows are generated by arc and electron-beam evaporation mechanisms in a context of Physical Vapor Deposition process. The thesis contains formalization of approaches for geometric construction of operating reflective surfaces of electron-ion installations. The author offers algorithmic base that regards calculus of multiple reflection of rays from surfaces approximated by triangles, surfaces given in implicit and vector form. An equation of a surface family is derived with characteristic of equal irradiance of each surface along the family. It is shown that a surface of equal irradiance consists of two cavities, which may degenerate into one. A surface correspondent to parameter k=0 is a surface of a catacaustic. The author provides solution of a problem of calculation of coating thickness deposited employing a scheme with heated reflector. A methodology of the geometric simulation study of the spatial distribution of multiply reflected rays is developed. The methodology grounds on spherical and hyperspherical reflection maps and does not depend on the complexity of the surface of the reflector. The research yields calculated values of plasma purification degree for four versions of open type filters with a fractal model of the source of macroparticles. The work contains description of a software implementation of the proposed methods and algorithms that make up foundation of a complete system for simulation and visualization of material vapor flows filtering in vacuum. Visualization employs newly developed methods and algorithms for creating photorealistic quality picture of the working surfaces of equipment together with an image of the process of materials evaporation. A technique of scene rendering process optimization is given.