Bohdanov R. Synthesis of carbon nanomaterials in magnetron plasma

The work is devoted to the determination of the conditions for the synthesis of carbon nanomaterials by the method of magnetron sputtering using a magnetron sputtering device with two erosion zones (DZMSD). The determination of the parameters of the graphite target sputtering process and the deposition of carbon films were based as on the experiments on this DZMSD as on the results of the developed computer modeling. Computer simulations (by the Monte Carlo method with particles) have made it possible to predict the optimal modes for obtaining carbon films with sp2- bonds between carbon atoms on the DZMSD: discharge current not less than 100 mA at voltages greater than 500 V, at a working gas pressure Ar not more than 2 Pa. Under these modes, the energy of sputtered from the target C atoms is reached 7.04 eV. From the simulations shown that at a distance (3 .. 4) cm from the cathode-target of DZMSD uniformity of the C atoms flux is significantly greater than at a distance of 2 cm, and the energy of sputtered particles at a pressure less than 2 Pa does not depend on the distance between the target and substrate.